Proceedings of the Korean Ceranic Society Conference (한국세라믹학회:학술대회논문집)
- 2003.04a
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- Pages.142.1-142
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- 2003
Preferred Orientation Behavior of ITO Thin Films Prepared by RF-Magnetron Sputtering Method with Various Process Parameters
RF-Magnetron Sputtering 법의 공정변수 변화에 따른 ITO 박막 결정은 우선 배향 거동
Abstract
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