MOCVD growth of $RuO_{2}$ thin films on Si(001) substrates using(${\eta}^{6}$-benzene)(${\eta}^{4}$-1,3-cyclohexa diene)Ru

Hwang, H.N. (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
Han, K.C. (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
An, K.S. (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
Lee, S.S. (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
Chung, T.M. (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
Kim, Y. (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology)