Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.04a
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- Pages.206-209
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- 2003
A thin film condition of material for AR and HR coating by the DC/RF Magnetron Sputter
DC/RF Magnetron Sputter를 이용한 무반사 및 고반사 박막증착
- Yang, Jin-Seok (KIST) ;
- Jo, Woon-Jo (KIST) ;
- Lee, Cheon (INHA Univ.) ;
- Kim, Dong-Woo (KIST) ;
- Shinn, Chun-Kyo (KIST)
- Published : 2003.04.19
Abstract
The purpose of AR and HR coating is acquire the very low reflection rate and the high reflection rate through the deposition of a thin film using the refraction ofmaterial. Basically if the high refractive material and the low refractive material are chosen and the condition for the experiment is determined, then we solve theproject with the optical design and multi thin film coating. First of all, we choose