Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Characteristics of the Polarization Dependence Holographic Diffraction Efficiency using the $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ Multi-Layer

$MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ 다층박막에서 편광상태에 따른 회절효율 특성

  • Lee, Jung-Tae (Department of Electronic Materials Eng, Kwangwoon Univ.) ;
  • Yeo, Cheol-Ho (Department of Electronic Materials Eng, Kwangwoon Univ.) ;
  • Shin, Kyung (Department of Electronic Materials Eng, Kwangwoon Univ.) ;
  • Lee, Ki-Nam (Department of Electronic Materials Eng, Kwangwoon Univ.) ;
  • Kim, Jong-Bin (Department of Electronic Eng, Chosun Univ.) ;
  • Chung, Hong-Bay (Department of Electronic Materials Eng, Kwangwoon Univ.)
  • 이정태 (광운대학교 전자재료공학과) ;
  • 여철호 (광운대학교 전자재료공학과) ;
  • 신경 (광운대학교 전자재료공학과) ;
  • 이기남 (광운대학교 전자재료공학과) ;
  • 김종빈 (조선대학교 전자공학과) ;
  • 정홍배 (광운대학교 전자재료공학과)
  • Published : 2003.04.19
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Abstract

We have carried out two-beam interference experiment to form holographic grating on amorphous $As_{40}Ge_{10}Se_{15}S_{35}$ single-laver, $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ muliti-layer. In this study holographic grating formed using He-Ne laser(632.8nm) under different polarization state(intensity, phase polarization holography). The diffraction efficiency was obtained by first order intensity. The maximum diffraction efficiency of $As_{40}Ge_{10}Se_{15}S_{35}$ single-laver was 0.8% and The maximum diffraction efficiency of $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer(multi-layer I, multi-layer II) were 1.4% and 3.1%.

Keywords