Physical and Electrical Properties of Amorphous Carbon(a-C) Thin Films Grown by High Rate DC Magnetron Sputtering method

고효율 DC 마그네트론 스파터링법으로 성장시킨 다이아몬드상 카본의 물리적, 전기적 특징

Thin films of amorphous carbon (a-C) generally combine high wear resistance with low friction coefficients and a-C films have widespread applications as protective coatings and passivation of electrical circuit and insulating layer. In this work we deposited the amorphous carbon (a-C) films on silicon substrate with a high rate DC magnetron sputtering system. It is obtained parameters on the deposition rate and physical properties of a-C films using a wide range of Ar gas pressure and DC power. The physical properties of the films were analyzed by Nanoindenter and AFM (Atomic Force Microscopy), The electrical properties were investigated by electrical conductivity measurement.