한국정보디스플레이학회:학술대회논문집

The Korean Infomation Display Society (한국정보디스플레이학회)
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Characteristics of Surface Roughness as a Film Thickness and Planarization of SLS Poly-Si Films

  • Sohn, Choong-Yong (Basic Research Lab., Electronics and Telecommunications Research Institute) ;
  • Kim, Yong-Hae (Basic Research Lab., Electronics and Telecommunications Research Institute) ;
  • Ko, Young-Wook (Basic Research Lab., Electronics and Telecommunications Research Institute) ;
  • Chung, Choong-Heui (Basic Research Lab., Electronics and Telecommunications Research Institute) ;
  • Hwang, Chi-Sun (Basic Research Lab., Electronics and Telecommunications Research Institute) ;
  • Song, Yoon-Song (Basic Research Lab., Electronics and Telecommunications Research Institute) ;
  • Lee, Jin-Ho (Basic Research Lab., Electronics and Telecommunications Research Institute)
  • Published : 2003.07.09
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Abstract

We report on a surface planarization process that produces more planar surface than previous sequential lateral solidification crystallized poly silicon films. By applying the single shot laser irradiation with optimum energy density ($(817mJ/cm^{2})$ on the ridge area after SLS crystallization, the ridge height can be decreased.

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