한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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- Pages.201-202
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- 2003
Carbon Nanotube Deposition using Helicon Plasma CVD at Low Temperature
- Muroyama, Masakazu (SONY Corporation) ;
- Kazuto, Kimura (SONY Corporation) ;
- Yagi, Takao (SONY Corporation) ;
- Inoue, Kouji (SONY Corporation) ;
- Saito, Ichiro (SONY Corporation)
- 발행 : 2003.07.09
초록
We developed a novel growth method of aligned carbon nanotubes. Aligned carbon nanotubes are grown on a metal catalyst on a glass substrate using biased Helicon plasma chemical vapor deposition (HPECVD) of
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