Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.11a
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- Pages.11-14
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- 2003
Characterization of Nitrided $HfO_2(HfO_xN_y)$ for Gate Dielectric Application using Plasma
게이트 유전체 적용을 위한 플라즈마를 이용해 질화된 $HfO_2$ 박막의 특성 평가
- Kim,, Jeon-Ho (Chungnam Nat'l Univ) ;
- Choi, Kyu-Jeong (Chungnam Nat'l Univ) ;
- Yoon, Soon-Gil (Chungnam Nat'l Univ) ;
- Lee, Won-Jae (Dong-Eui Univ)
- Published : 2003.11.13
Abstract
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