Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07b
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- Pages.1147-1150
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- 2003
The Study on Electromagnetic Distribution of Electrodeless Fluorescent Lamp
무전극 형광램프의 페라이트 특성변화에 따른 전자계 분포
- Kim, Kwang-Soo (School of Electrical and Electronic Engineering, Wonkwang Univ.) ;
- Jo, Ju-Ung (School of Electrical and Electronic Engineering, Wonkwang Univ.) ;
- Her, In-Sung (School of Electrical and Electronic Engineering, Wonkwang Univ.) ;
- Choi, Yong-Sung (School of Electrical and Electronic Engineering, Wonkwang Univ.) ;
- Park, Dae-Hee (School of Electrical and Electronic Engineering, Wonkwang Univ.)
- Published : 2003.07.10
Abstract
The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology Although most practical ICPs operate at 13.56 (MHz) and 2.65 (MHz), the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65 (MHz) will be discussed, by using the electromagnetic simulation (Maxwell 2D).