Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07b
- /
- Pages.953-956
- /
- 2003
A study on properties of ZnO:Ga thin films fabricated by RF Magnetron sputtering
RF Magnetron sputtering으로 증착한 ZnO:Ga의 특성에 관한 연구
Abstract
Transparent conductive ZnO:Ga thin films were deposited on glass substrates using rf magnetron sputtering method for flat panel display. The ZnO:Ga films were preferentially oriented to c-axis (002) of on substrates. The surface morphology was smooth and had not porous whatever substrate temperature was. The electrical conductivity of the thin films were in the range of