Dielectric Properties of Amorphous and Composite Alkoxi-derived Alumina Thin Films

The development of new improved type of dielectric materials on the conception of multiphase structure has been carried out in this paper. Metal alkoxides solutions were used for application of thin film by electrophoretic deposition technique. We succeeded in preparation of amorphous and composite dielectric films from Al alkoxides. Specific features of the preparation technique were considered. Microstructure of the films was examined as well as their dielectric properties. TEM analyses reveals that films deposited from aging sols and heat-treated at temperatures as low as $400^{\circ}C$ contain small whiskers of ${\delta}-Al_2O_3$.