Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07a
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- Pages.208-211
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- 2003
Formation of dielectric carbon nitride thin films using a pulsed laser ablation combined with high voltage discharge plasma
펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성
- Kim, Jong-Il (Korea Institute of Technical Education)
- 김종일 (한국기술교육대학교 정보기술공학부)
- Published : 2003.07.10
Abstract
The dielectric carbon nitride thin films were deposited onto Si(100) using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in nitrogen gas atmosphere. We can be calculated dielectric constant,