Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07a
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- Pages.54-57
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- 2003
Thermal Stability and Electrical Properties of $HfO_xN_y$ ($HfO_2$ ) Gate Dielectrics with TaN Gate Electrode
TaN 게이트 전극을 가진 $HfO_xN_y$ ($HfO_2$ ) 게이트 산화막의 열적 안정성
- Kim, Jeon-Ho (Chungnam Nat'l Univ) ;
- Choi, Kyu-Jeong (Chungnam Nat'l Univ) ;
- Yoon, Soon-Gil (Chungnam Nat'l Univ) ;
- Lee, Won-Jae (Dong-Eui Univ) ;
- Kim, Jin-Dong (DNF Solution)
- Published : 2003.07.10
Abstract
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