한국표면공학회:학술대회논문집 (Proceedings of the Korean Institute of Surface Engineering Conference)

한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지

Study on the Microstructure of Trivalent Chrome Layers b AFM and SANS

  • Choi, Y. (Sunmoon University) ;
  • Lee, J.J. (Sunmoon University) ;
  • Lee, B.K. (Sunmoon University) ;
  • Kim, M. (Korea Institute of Machinery and Materials) ;
  • Kwon, S.C. (Korea Institute of Machinery and Materials) ;
  • Seung, B.S. (HANARO Center, Korea Atomic Energy Research Institute)
  • 발행 : 2003.05.01
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초록

It is important to know SIze distribution of defects In electroplated trivalent chrome layers because it significantly influences on performance of the layers. Most of the nano-scale defects are able to be introduced by hydrogen evolution during the plating. Little information is available on the nano-size defects. In this study, SANS was applied to determine the size distribution of nano-scale defects in the trivalent chrome layers prepared in a formate bath. The defect size and distribution was dependent upon plating conditions such as current density and applied voltage. SANS is one of useful techniques to determine the nano-scale defect in the electroplated layers.

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