Electrical characteristics of an optically controlled N-channel Si-MOSFET for possible application to OEICs on Si substrate

  • 백강현 (국민대학교 공과대학 전자공학부) ;
  • 임석진 (국민대학교 공과대학 전자공학부) ;
  • 임광만 (국민대학교 공과대학 전자공학부) ;
  • 김동명 (국민대학교 공과대학 전자공학부)
  • Published : 1998.06.01

Abstract

In this paper, electrical characteristics of an n-channel Si MOSFET with L$_{s}$=0.6.mu.m under optical illumination are charaterized on wafer. Energetic photons with .gamma.=830nm, hv=1.494eV, P$_{opt}$=300mW are injected near the drain junction, the most photoresponsive region in the device, via optical fiber. We observed significantly increased drain current and transconductance, which is considered to be useful for the implementation of OEICs on silicon substrate, under optical control with P$_{opt}$=300mW. Optical power-dependent physical mechanisms responsible for the variation of electrical characteristics under optical input are also reported.d.d.d.

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