Interfacial diffusion in Fe/Cr multilayers studied by synchrotron x-ray techniques

  • Cho Tae Sik (Department of Materials Science and Engineering, Sangju National University) ;
  • Doh Seok Joo (System LSI, Device Solution Network, Samsung Electronics Co.) ;
  • Je Jung Ho (Department of Materials Science and Engineering, POSTECH) ;
  • Noh Do Young (Department of Materials Science and Engineering, K-JIST) ;
  • Hosoito N. (Institute fur Chemical Research, Kyoto University)
  • Published : 2003.12.01