Effect of elevating rate of temperature in thermal annealings on crystallographic phase transformation of FePt sputtered films

Takahashi K. (Department of Electrical & Electronic Eng., Toyohashi University of Technology) ;
Aimutal K. (Department of Electrical & Electronic Eng., Toyohashi University of Technology) ;
Nishimura K. (Department of Electrical & Electronic Eng., Toyohashi University of Technology) ;
Hashi S. (Dept. of Material Science & Technology, Gifu University) ;
Uchida Hironaga (Department of Electrical & Electronic Eng., Toyohashi University of Technology) ;
Inoue Mitsuteru (Department of Electrical & Electronic Eng., Toyohashi University of Technology, CREST, Japan Science and Technology Corporation)