Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference (한국윤활학회:학술대회논문집)
- 2002.10b
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- Pages.67-68
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- 2002
Nanoscale Processing on Silicon by Tribochemical Reaction
- Kim, J. (Department of System Engineering, Nippon Institute of Technology) ;
- Miyake, S. (Department of System Engineering, Nippon Institute of Technology) ;
- Suzuki, K. (Department of System Engineering, Nippon Institute of Technology)
- Published : 2002.10.21
Abstract
The properties and mechanism of silicon protuberance and groove processing by diamond tip sliding using atomic force microscope (AFM) in atmosphere were studied. To control the height of protuberance and the depth of groove, the processed height and depth depended on load and diamond tip radius were evaluated. Nanoprotuberances and grooves were fabricated on a silicon surface by approximately 100-nm-radius diamond tip sliding using an atomic force microscope in atmosphere. To clarify the mechanical and chemical properties of these parts processed, changes in the protuberance and groove profiles due to additional diamond tip sliding and potassium hydroxide (KOH) solution etching were evaluated. Processed protuberances were negligibly removed, and processed grooves were easily removed by additional diamond tip sliding. The KOH solution selectively etched the unprocessed silicon area. while the protuberances, grooves and flat surfaces processed by diamond tip sliding were negligibly etched. Three-dimensional nanofabrication is performed in this study by utilizing these mechanic-chemically processed parts as protective etching mask for KOH solution etching.
Keywords
- Microprocessing;
- Tribochemical processing;
- Local oxidation;
- Protective etching mask;
- Atomic force microscope