Ti thin film deposited by grid-assisted magnetron sputtering

  • Jung, Min-J (Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Nam, Kyung-H (Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Han, Jeon-G (Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Shaginyan, Leonid R. (Institute for Problems of Materials Science of academy of sciences of Ukraine)
  • 발행 : 2002.06.27