Deposition and characterization of Ti-Al-N thin films deposited by plasma-assisted atomic layer deposition

  • Lee, Yong-Ju (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST)) ;
  • Kang, Sang-Won (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST))
  • Published : 2002.06.27