Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2002.11a
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- Pages.59-61
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- 2002
A study for the distribution of plasma density in RF glow discharge
RF 글로우 방전에서의 플라즈마 밀도의 분포에 대한 연구
-
Keem, Ki-Hyun
(Electrical Engineering, Korea University)
;
- Hwang, Joo-Won (Electrical Engineering, Korea University) ;
-
Min, Byeong-Don
(Electrical Engineering, Korea University)
;
-
Kim, Sang-Sig
(Electrical Engineering, Korea University)
- Published : 2002.11.07
Abstract
In this study we attempted to diagnose the distribution of nitrogen plasma density generated using PECVD(plasma enhanced chemical vapor deposition). The distribution of plasma density formed in a PECVD chamber were measured by DLP2000. The experiment results showed that the plasma density is related to RF power and gas flow rate. As RF power gets higher, the plasma density linearly increased. And the experimental results revealed that a pressure in chamber affects plasma density.