한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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- Pages.62-65
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- 2002
HCL 습식 에칭에 의한 ZnO:Al 투명전도막의 전기적, 광학적 특성
The electrical and optical properties of transparent ZnO:Al films using HCl wet chemical etching
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유진수
(한국에너지기술연구원 태양광발전연구팀) ;
-
이정철
(한국에너지기술연구원 태양광발전연구팀) ;
-
강기환
(한국에너지기술연구원 태양광발전연구팀) ;
-
김석기
(한국에너지기술연구원 태양광발전연구팀) ;
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윤경훈
(한국에너지기술연구원 태양광발전연구팀) ;
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송진수
(한국에너지기술연구원 태양광발전연구팀) ;
- 박이준 (한국에너지기술연구원 태양광발전연구팀)
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Yoo, Jin-Su
;
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Lee, Jeong-Chul
;
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Kang, Ki-Hwan
;
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Kim, Seok-Ki
;
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Yoon, Kyung-Hoon
;
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Song, Jin-Soo
;
- Park, I-Jun
- 발행 : 2002.05.17
초록
Transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Coming 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures