Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2002.05c
- /
- Pages.83-87
- /
- 2002
Physical properties and electrical characteristic analysis of silicon nitride deposited by PECVD using $N_2$ and $SiH_4$ gases
$N_2$ 와 $SiH_4$ 가스를 사용하여 PECVD로 증착된 Silicon Nitride의 물성적 특성과 전기적 특성에 관한 연구
Abstract
Plasma enhanced chemical vapor deposited (PECVD) silicon nitride (