한국정보디스플레이학회:학술대회논문집
- 2002.08a
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- Pages.842-845
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- 2002
Properties of ITO (Indium Tin Oxide) Thin Films Prepared by Magnetron Sputtering Using DC and Pulse Modes
- Hwang, Man-Soo (ITM, Inc.) ;
- Lee, Hye-Jung (ITM, Inc.) ;
- Jeong, Heui-Seob (ITM, Inc.) ;
- Seo, Yong-Woon (ITM, Inc.) ;
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Kwon, Sang-Jik
(Kyungwon University)
- Published : 2002.08.21
Abstract
We report on the properties of ITO thin films prepared by dc and pulse magnetron sputtering at low temperature. The electrical, optical, and surface properties of the films prepared by dc and pulse magnetron sputtering were compared. We discuss the role the pulse power plays in determining ITO thin film properties that are important in flat panel applications.
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