한국정보디스플레이학회:학술대회논문집
- 2002.08a
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- Pages.526-529
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- 2002
Microcrystalline Silicon Film Growth on a Fluoride Film Coated Glass Substrate
- Kim, Do-Young (New material Lab., School of Information and Communication Engineering, SungKyunKwan University) ;
- Park, Joong-Hyun (New material Lab., School of Information and Communication Engineering, SungKyunKwan University) ;
- Ahn, Byung-Jae (New material Lab., School of Information and Communication Engineering, SungKyunKwan University) ;
- Yoo, Jin-Su (New material Lab., School of Information and Communication Engineering, SungKyunKwan University) ;
- Yi, Jun-Sin (New material Lab., School of Information and Communication Engineering, SungKyunKwan University)
- Published : 2002.08.21
Abstract
Various fluoride films on a glass substrate were prepared and characterized in order to determine the best seed layer for a microcrystalline silicon (
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