Visualization of Laser-Produced, Xe Gas Plasma in EUV Light Sources for the Lithography

EUV 리소그라피 광원용 레이저 생성 Xe 가스 플라즈마의 가시화

Extreme ultraviolet (EUV) radiation of wavelength $\lambda$~10 nm or photon energy hv~100 eV is presently a blank region in the electromagnetic spectrum where applications are concerned. This is because no powerful sources were available until when intense-laser-produced plasmas are available. Both a new laboratory-sized source of EUV radiation and its new applications in lithography of semiconductor devices have been developed. (omitted)