Proceedings of the International Microelectronics And Packaging Society Conference (한국마이크로전자및패키징학회:학술대회논문집)
- 2002.11a
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- Pages.115-121
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- 2002
Characterization of $HfO_2 /SiON$ stack structure for gate dielectrics
ALD를 이용한 극박막 $HfO_2 /SiON$ stack structure의 특성 평가
- Kim, Youngsoon (Department of Materials Science & Engineering, Hanyang University) ;
- Lee, Taeho (Department of Materials Science & Engineering, Hanyang University) ;
- Jaemin Oh (Department of Materials Science & Engineering, Hanyang University) ;
- Jinho Ahn (Department of Materials Science & Engineering, Hanyang University) ;
- Jaehak Jung (Evertek corporation)
- Published : 2002.11.01
Abstract
In this research we have investigated the characteristics of ultra thin
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