Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2002.11a
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- Pages.198-198
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- 2002
Characterization of hafnium and zirconium silicate films fabricated by plasma-enhanced chemical vapor deposition
- Hiromitsu Kato (Department of Electrical, Electronics, and Computer Engineering, Waseda University) ;
- Tomohiro Nango (Department of Electrical, Electronics, and Computer Engineering, Waseda University) ;
- Takeshi Miyagawa (Department of Electrical, Electronics, and Computer Engineering, Waseda University) ;
- Takahiro Katagiri (Department of Electrical, Electronics, and Computer Engineering, Waseda University) ;
- Yoshimichi Ohki (Department of Electrical, Electronics, and Computer Engineering, Waseda University) ;
- Seol, Kwang-Soo (RIKEN(The Institute of Physical and Chemical Research))
- Published : 2002.11.01
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