한국재료학회:학술대회논문집 (Proceedings of the Materials Research Society of Korea Conference)
- 한국재료학회 2002년도 춘계 학술발표강연 및 논문개요집
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- Pages.124-124
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- 2002
ECRCVD a-C:F 층간절연막 및 Cu/Ta/a-C:F/Si 다층구조의 특성에 미치는 플라즈마 처리의영향
Effect of Plasma Treatment on Properties of Interlayer Dielectric Fluoricated Amorphous Carbon (a-C:F) Prepared by ECRCVD and Cu/Ta/a-C:F/Si Multilayer Structure
- Yang, Sung-Hoon (Division of Materials Science and Engineering, Hanyang University) ;
- Ko, Myoung-Gyun (Department of Nano-structure Semiconductor Engineering, Hanyang University) ;
- Park, Jong-Wan (Division of Materials Science and Engineering, Hanyang University)
- 발행 : 2002.05.01