Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2002.05a
- /
- Pages.124-124
- /
- 2002
Effect of Plasma Treatment on Properties of Interlayer Dielectric Fluoricated Amorphous Carbon (a-C:F) Prepared by ECRCVD and Cu/Ta/a-C:F/Si Multilayer Structure
ECRCVD a-C:F 층간절연막 및 Cu/Ta/a-C:F/Si 다층구조의 특성에 미치는 플라즈마 처리의영향
- Yang, Sung-Hoon (Division of Materials Science and Engineering, Hanyang University) ;
- Ko, Myoung-Gyun (Department of Nano-structure Semiconductor Engineering, Hanyang University) ;
-
Park, Jong-Wan
(Division of Materials Science and Engineering, Hanyang University)
- Published : 2002.05.01
Abstract
Keywords