한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2002년도 하계학술대회 논문집
- /
- Pages.74-77
- /
- 2002
플라즈마 식각을 이용한 초전도 자속 흐름 트랜지스터 제작
Fabrication of Superconducting Flux Flow Transistor using Plasma etching
초록
The channel of the superconducting Flux Flow Transistor has been fabricated with plasma etching method using ICP. The ICP conditions were 700 W of ICP power, 150 W of rf chuck power, 5 mTorr of the pressure in chamber and 1:1 of Ar : Cl