The effects of Plasma exposure and annealing ambient on shallow junction formation using PSll

  • Cho, J.H. (Department of Physics, Hanyang University-Ansan, Advanced Analysis Center, Korea Institute of Science and Technology) ;
  • Han, S.H. (Advanced Analysis Center, Korea Institute of Science and Technology) ;
  • Lee, Y.H. (Advanced Analysis Center, Korea Institute of Science and Technology) ;
  • Kim, O.K. (Department of Physics, Hanyang University-Ansan) ;
  • Kim, Y.W. (Department of Physics, Hanyang University-Ansan, Advanced Analysis Center, Korea Institute of Science and Technology) ;
  • Lim, H.E. (Advanced Analysis Center, Korea Institute of Science and Technology)
  • 발행 : 2001.07.05