Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2001.07a
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- Pages.165-165
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- 2001
The effects of Plasma exposure and annealing ambient on shallow junction formation using PSll
- Cho, J.H. (Department of Physics, Hanyang University-Ansan, Advanced Analysis Center, Korea Institute of Science and Technology) ;
- Han, S.H. (Advanced Analysis Center, Korea Institute of Science and Technology) ;
- Lee, Y.H. (Advanced Analysis Center, Korea Institute of Science and Technology) ;
- Kim, O.K. (Department of Physics, Hanyang University-Ansan) ;
- Kim, Y.W. (Department of Physics, Hanyang University-Ansan, Advanced Analysis Center, Korea Institute of Science and Technology) ;
- Lim, H.E. (Advanced Analysis Center, Korea Institute of Science and Technology)
- Published : 2001.07.05
Abstract
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