한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2001년도 제21회 학술발표회 초록집
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- Pages.74-74
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- 2001
Thermal stability and the formation mechanism of the interfacial layer between WNx/Si(100)
- Choi, I.S. (Hynix Semiconductor Inc.) ;
- Park, J.C. (Hynix Semiconductor Inc.) ;
- Choi, J.T. (Hynix Semiconductor Inc.) ;
- Kim, H.J. (Hynix Semiconductor Inc.) ;
- Lee, S.Y. (Hynix Semiconductor Inc.)
- 발행 : 2001.07.05