Growth behavior and structural properties of titanium dioxide thin films on Si(100) and Si(111) substrates using single molecular precursor by high vacuum MOCVD

Jung, C.K. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Kang, B.C. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Chae, H.Y. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Kim, Y.S. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Seo, M.K. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Kim, S.K. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Lee, S.B. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Boo, J.H. (Department of Chemistry and Institute of Basic Science, Sungkyunkwan University) ;
Moon, Y.J. (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
Lee, J.Y. (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology)