Reactive Ion Etching of InP and InGaP using $Cl_{2}$ gas with $CH_{4}$ and Ar Addition

  • Yu, Jae-Su (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
  • Song, Jin-Dong ;
  • Bae, Seong-Ju (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
  • Kim, Jong-Min (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
  • Lee, Yong-Tak (Department of Information & Communications, Kwanju Institute of Science & Technology)
  • 발행 : 2001.02.22