Characteristcs of ZnO thin film by Ramp method

Ramp method로 제작한 ZnO 박막의 특성

To achieve ZnO layer with a high resistance, a new sputtering method with a Ramp method and cycled power process mode was developed. The specific resistance of the layers was in rang of $3*10^{10}{\Omega}cm$ to $2*10^{11}{\Omega}cm$. The characteristics of. ZnO thin films changed with working pressure and Ramp method were investigated by XRD(x-ray diffractometer), and SEM (scanning electron microscopy) analyses. This paper presents calculated and measured results for structures with thin ZnO layers. Measurements of SAW properties using thin ZnO layered structures will be shown. Also presented are results on the quality of ZnO films and specifics of the deposition process.