CVD 반응로 내부 회전 원판 주위의 유동 특성 연구

A Study on the Flow Characteristics over the Rotating Susceptor in CVD Reactor

  • 차관 (성균관대학교 대학원) ;
  • 김윤제 (성균관대학교 기계공학부) ;
  • 부진효 (성균관대학교 자연과학부)
  • 발행 : 2001.06.27

초록

The characteristics of the fluid flow and mass transfer in a vertical atmospheric pressure chemical vapor deposition (APCVD) are numerically studied. In order to get the optimal process parameters for the uniformity of deposition on a substrate, Navier-Stokes and energy equations have been solved for the pressure, mass-flow rate and temperature distribution in a CVD reactor. Results show that the thermal boundary condition at the reactor wall has an important effect in the formation of buoyancy-driven secondary cell when radiation effect is considered. Results also show that reduction of the buoyancy effect on the heated reactor improves the uniformity of deposition.

키워드