Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.07a
- /
- Pages.725-728
- /
- 2001
The effect of the process parameters on the electrical properties of Ni/Cr/Al/Cu alloy thin film
공정변수에 의한 Ni/Cr/Al/Cu계 박막의 전기적 특성
Abstract
We have fabricated thin films using the DC/RF magnetron sputtering of 74wt%Ni-l8wt%Cr-4wt%Al-4wt%Cu alloy target and studied the effect of the process parameters on the electrical properties for low TCR(Temperature Coefficient of Resistance) films. In sputtering process, pressure, power and substrate temperature, are varied as controllable parameter. The films are annealed to 400