한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

레이저 층착법에 의해 형성된 $Gd_{2}O_{3}$박막의 구조와 광학적 특성

Structure and optical Properties of $Gd_{2}O_{3}$ thin films on glass Prepared by Pulsed Laser Deposition

  • 이경철 (인하대학교 전기공학과) ;
  • 이천 (인하대학교 전기공학과) ;
  • 조신호 (인하대학교 전기공학과) ;
  • 박중철 (인하대학교 전기공학과)
  • 발행 : 2001.07.01
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초록

The pulsed laser deposition(PLD) technology was used for the deposition of phosphor substance, Gd$_2$O$_3$on commercial glass. An Nd:YAG laser was employed for the deposition (wavelength 266nm, energy up to 100mJ/pu1se, pulse duration is 5ns and repetition rate 10 Hz). With respect to films grown by conventional PLD, this study exhibited the condition at normal temperature. Experiments were done without any reactive gas at a pressure of 10$^{-5}$ ~10$^{-6}$ Torr using second harmonic(λ=532 nm) and fourth harmonic(λ=266 nm) Nd:YAG laser. Analyses of the deposited material grown are performed by EDX, AFM, SEM, PL meseurements.

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