Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2000.05b
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- Pages.142-145
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- 2000
Preparation of MgO Protective Layer for AC PDP by Unbalanced Magnetron Sputtering
불평형 마그네트론 스파터링에 의한 AC PDP의 MgO 보호층 형성에 관한 연구
- Ko, Kwang-Sic (Dept. of Electrical Engineering, Pusan National University) ;
- Kim, Young-Kee (Dept. of Electrical Engineering, Pusan National University) ;
- Park, Jung-Tae (Dept. of Electrical Engineering, Pusan National University) ;
- Kim, Eun-Chin (Dept. of Electrical Engineering, Pusan National University) ;
-
Cho, Jung-Soo
(Dept. of Electrical Engineering, Pusan National University)
;
-
Park, Chung-Hoo
(Dept. of Electrical Engineering, Pusan National University)
- 고광식 (부산대학교 전기공학과) ;
- 김영기 (부산대학교 전기공학과) ;
- 박정태 (부산대학교 전기공학과) ;
- 김언진 (부산대학교 전기공학과) ;
-
조정수
(부산대학교 전기공학과)
;
-
박정후
(부산대학교 전기공학과)
- Published : 2000.05.13
Abstract
The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the dc bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.
Keywords