한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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- Pages.157-158
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- 2000
Characterization of Thin Film Transistor using $Ta_2O_5$ Gate Dielectric
- Um, Myung-Yoon (School of Materials Science and Engineering, Seoul National University) ;
- Lee, Seok-Kiu (School of Materials Science and Engineering, Seoul National University) ;
- Kim, Hyeong-Joon (School of Materials Science and Engineering, Seoul National University)
- 발행 : 2000.01.13
초록
In this study, to get the larger drain current of the device under the same operation condition as the conventional gate dielectric SiNx thin film transistor devices, we introduced new gate dielectric
키워드