Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of Metal Thin-Film Type Pressure Sensors

금속박막형 압력센서의 제작

  • 최성규 (영남대학교 전자공학과) ;
  • 김병태 (동서대학교 정보통신공학부) ;
  • 남효덕 (영남대학교 전자공학과) ;
  • 정귀상 (동서대학교 정보통신공학부)
  • Published : 2000.11.01
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Abstract

This paper presents the characteristics of metal thin-film pressure sensors. The micro pressure sensors consists of a chrom thin-film, patterned on a Wheatstone bridge configuration, sputter-deposited onto thermally oxidized Si wafer an aluminium interconnection layer. The fabricated micro pressure sensors shows a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.16~1.21 mV/V.kgf/$\textrm{cm}^2$ in the temperature range of 25~l0$0^{\circ}C$ and the maximum non-linearity is 0.21 %FS.

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