Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 2000.06b
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- Pages.20-23
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- 2000
High-k Gate Dielectric for sub-0.1$\mu\textrm{m}$ MOSFET
차세대 sub-0.1$\mu\textrm{m}$ 급 MOSFET소자용 고유전율 게이트 박막
Abstract
We have investigated a process for the preparation of high-quality tantalum oxynitride (
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