Proceedings of the International Microelectronics And Packaging Society Conference (한국마이크로전자및패키징학회:학술대회논문집)
- 2000.04a
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- Pages.109-109
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- 2000
Low temperature growth of carbon nanotube by plasma enhanced chemical vapor deposition (PECVD) using nickel catalyst
- Ryu, Kyoung-Min (Division of Materials Science and Engineering, Hanyang University) ;
- Kang, Mih-Yun (Division of Materials Science and Engineering, Hanyang University) ;
- Kim, Yang-Do (Division of Materials Science and Engineering, Hanyang University) ;
- Hyeongtag-Jeon (Division of Materials Science and Engineering, Hanyang University)
- Published : 2000.04.01
Abstract
Recently, carbon nanotube has been investigating for field emission display ( (FED) applications due to its high electron emission at relatively low electric field. However, the growing of carbon nanotube generally requires relatively high temperature processing such as arc-discharge (5,000 ~
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