The Mechanism of Gold Deposition by Thermal Evaporation

  • Mark C. Barnes (Center for Microstructure Science of Materials Seoul National University) ;
  • Kim, Doh-Y. (Center for Microstructure Science of Materials Seoul National University) ;
  • Nong M. Hwang (Korea Research Institute of Standards and Science)
  • 발행 : 2000.06.01

초록

The charged cluster model states that chemical vapor deposition (CVD) begins with gas phase nucleation of charged clusters followed by cluster deposition on a substrate surface to form a thin film. A two-chambered CVD system, separated by a 1-mm orifice, was used to study gold deposition by thermal evaporation in order to determine if the CCM applies in this case. At a filament temperature of 1523 and 1773 K, the presence of nano-meter sized gold clusters was found to be positive and the cluster size and size distribution increased with increasing temperature. Small clusters were found to be amorphous and they combined with clusters already deposited on a substrate surface to form larger amorphous clusters on the surface. This work revealed that gold thin films deposited on a mica surface are the result of the sticking of 4-10 nm clusters. The topography of these films was similar to those reported previously under similar conditions.

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