Alicyclic Polymers Based on t-BOC Norbornene Derivatives and Maleic Anhydride for Applications as ArF Photoresists

Ahn Kwang-Duk (Functional Polymer Laboratory, Korea Institute of Science and Technology) ;
Kang Jong-Hee (Functional Polymer Laboratory, Korea Institute of Science and Technology) ;
Lee Jae-Hyung (Functional Polymer Laboratory, Korea Institute of Science and Technology) ;
Shin Jung-Han (Functional Polymer Laboratory, Korea Institute of Science and Technology) ;
Kim Jong-Man (Functional Polymer Laboratory, Korea Institute of Science and Technology) ;
Han Dong-Keun (Functional Polymer Laboratory, Korea Institute of Science and Technology) ;
Park Jae-Geun (Chemical Sector, Samsung Advanced Institute of Technology) ;
Moon Seong-Yun (Chemical Sector, Samsung Advanced Institute of Technology) ;
Moon Bong-Seok (Chemical Sector, Samsung Advanced Institute of Technology) ;
Noh Chang-Ho (Chemical Sector, Samsung Advanced Institute of Technology)