Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 1999.05a
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- Pages.60-61
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- 1999
Dry etch characteristics of RuO2 thin film using magnetized inductively coupled plasmas
MICP에 의한 $RuO_2$ 박막의 건식 식각 특성
Abstract
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