Thermal Stability of epitaxial $CoSi_2$ layer on (100) Si substrate from cobalt-carbon film deposited by MOCVD

  • Rhee, Hwa-Sung (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
  • Lee, Heui-Seung (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
  • Ahn, Byung-Tae (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology)
  • Published : 1999.05.01