Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1999.11a
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- Pages.406-408
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- 1999
A Study on carbon nitride thin films prepared by RF reactively sputtering
RF 반응성 스퍼터링에 의한 비정질 carbon nitride 박막의 제조에 관한 연구
Abstract
Amorphous carbon nitride thin films were prepared on pretreated silicon(100) substrate in sputtering graphite target by activated gas phase using RF reactively sputtering. We measured the FT-IR spectrum to identify C=N(nitrile)stretching mode(2200cm
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