EFFECT OF THE OXYGEN RADICAL ON ITO THIN FILM DEPOSITED AT ROOM TEMPERATURE USING IBAD(ION BEAM ASSISTED DEPOSITION) METHOD

OXYGEN ION BEAM ASSISTED DEPOSITION 법으로 유기막 위에 증착된 상온 ITO (INDIUM TIN OXIDE) 박막의 특성

  • Kim, J. S. (Sung Kyun Kwan University Dept.of Materials Engineering) ;
  • J. W. Bae (Sung Kyun Kwan University Dept.of Materials Engineering) ;
  • Kim, H. J. (Sung Kyun Kwan University Dept.of Materials Engineering) ;
  • Lee, N. E. (Sung Kyun Kwan University Dept.of Materials Engineering) ;
  • G. Y. Yeom (Sung Kyun Kwan University Dept.of Materials Engineering)
  • Published : 1999.11.01